Dresden 2003 – wissenschaftliches Programm
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M: Metallphysik
M 41: Postersitzung
M 41.37: Poster
Donnerstag, 27. März 2003, 14:30–16:30, HSZ
Initital oxidation stages in thin titanium films — •Sibylle Gemming1, Michael Schreiber1,2, and Igor Chaplygin1 — 1Institut für Physik, Technische Universität, D-09107 Chemnitz — 2School of Engineering and Science, International University Bremen, D-28725 Bremen
Titanium interacts readily with a large variety of different materials ranging from ionic oxides to noble metals. Therefore, thin films of titanium have been employed successfully as a kind of nano-glue to enhance adhesion between dissimilar materials which otherwise would not bond. The easy change between different oxidation states and the versatile hybridisation patterns of the valence s and d electrons are the electronic origin of the adhesion enhancement. However, the high reactivity of titanium can also lead to an auto-catalytic oxidative corrosion of the glue layer. The present investigation aims at analysing the i stages of this undesired side reaction in order to understand the failure mechanism and prevent fatigue. For this purpose supercell calculations are carried out in the density functional theory with the full potential local orbitals code FPLO [1]. [1] K. Koepernik, h.Eschrig, Phys. Rev. B 59, 1743 (1999); I. Opahle, K. Koepernik, H.Eschrig, Phys. Rev. B 60, 14035 (1999).