Dresden 2003 – wissenschaftliches Programm

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O: Oberflächenphysik

O 12: Postersitzung (Struktur und Dynamik reiner Oberfl
ächen, Grenzfl
äche fest-flüssig, Nanostrukturen, Teilchen und Cluster, Halbleiteroberfl
ächen und Grenzfl
ächen, Zeitaufgelöste Spektroskopie, Rastersondentechniken, Methodisches)

O 12.63: Poster

Montag, 24. März 2003, 18:00–21:00, P1

Deposition of Ti clusters on Si Substrate using DC magnetron sputtering — •Ibrahimkutty Shyjumon, Manesh Gopinathan, Rainer Hippler, and Christiane A. Helm — Department of Physics, University of Greifswald

A cluster beam has been produced by DC Magnetron sputtering. A Ti target is used. The pressure ratio between the magnetron chamber and deposition chamber is of the order of 100. The wall temperature for the magnetron chamber is controllable and has values less than 0^∘C. The produced Ti clusters are directed and deposited on a Si substrate.

The deposited films were characterised by XPS to get the chemical composition, as well as by AFM to get the surface structure. Experiments were carried out at different deposition times and different temperatures inside the magnetron chamber. The size and the number of deposited clusters were investigated. The cluster size strongly depends on the temperature inside the magnetron chamber. The experimental results will be discussed.