Dresden 2003 – wissenschaftliches Programm
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O: Oberflächenphysik
O 18: Rastersondentechniken II
O 18.6: Vortrag
Dienstag, 25. März 2003, 12:30–12:45, M\"UL/ELCH
Integrated System Solutions for Nanotechnology: High Resolution SEM combined with state-of-the-art SPM Technology — •Markus Maier1, J. Zach2, J. Bihr3, J. Westermann2, G. Schaefer2, A. Feltz2, and T. Berghaus2 — 1OMICRON NanoTechnology GmbH, Limburger Str. 75 — 2CEOS GmbH, Englerstr. 28, D-69129 Heidelberg, Germany — 3LEO Elektronenmikroskope GmbH, Carl-Zeiss-Str. 56, D-73447 Oberkochen, Germany
New challenging application fields are emerging from Semiconductor- and Nanotechnology. Here, a key issue is the non-destructive SEM imaging of typically very sensitive structures with dimensions below the 10nm benchmark. As an ultimate tool for these requirements, we developed the UHV Gemini SEM featuring low beam voltages, high resolution with high beam currents. As a new approach for nowadays nanotechnology, the integration of this SEM column with dedicated SPMs will be presented. First, a combined SEM/SPM features highest flexibility for simultaneous atomic resolution SPM and high resolution SEM/SAM. Additional techniques such as EBL, FIB, XPS, SEMPA allow for true multi-technique surface science on the very same sample area. As a second approach, the SEM column is utilised as an ultimate navigation tool for up to four independent SPMs. This enables SPM imaging with each probe and local non-destructive electrical characterisation of nano-devices with individual probes as nano-contacts. Various applications and results will be shown both for SEM and SPM as well as the interaction of both techniques. For the SEM, an ultimate resolution below 3nm at 15kV beam energy and below 5nm at 3kV is proven. High beam currents are enabling this column to be used as an excitation source for chemical characterisation with ultimate spatial resolution and surface sensitivity in SAM or EDX.