Dresden 2003 – wissenschaftliches Programm
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O: Oberflächenphysik
O 24: Postersitzung (Epitaxie und Wachstum, Oxide und Isolatoren, Elektronische Struktur, Oberfl
ächenreaktionen, Adsorption an Oberfl
ächen, Organische Dünnschichten)
O 24.65: Poster
Mittwoch, 26. März 2003, 14:30–17:30, P1
Wetting-dewetting of hydrogen isotopes on different substrates — •Masoud Sohaili, Stefan Tibus, Jörg Angrik, Jürgen Klier, and Paul Leiderer — Universität Konstanz, Fachbereich Physik, D-78434 Konstanz, Germany
The behaviour of adsorbed films of H2, D2, and mixtures of them, is investigated with respect to both roughness and interaction of the substrate. In general, dewetting of a solid substrate by H2, or other noble gases, is temperature dependent and occurs below the bulk triple-point, T3, of the respective adsorbant. In other words, this transition is associated with the changing of the state of the film from liquid to solid, dewetting, or solid to liquid, wetting, on the surface. Recent calculations, by considering the surface profile of practical substrates, imply the finite roughness of the substrate to be the decisive effect (Esztermann et al., PRL 88, 55702 (2002)). We present different ways to modify and improve the surface quality of the substrates for such wetting studies of liquid and solid van der Waals films. Furthermore, we show how the wetting behaviour of liquid and solid H2-D2 mixtures depends on the concentration ratio of their species.