Dresden 2003 – wissenschaftliches Programm
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O: Oberflächenphysik
O 24: Postersitzung (Epitaxie und Wachstum, Oxide und Isolatoren, Elektronische Struktur, Oberfl
ächenreaktionen, Adsorption an Oberfl
ächen, Organische Dünnschichten)
O 24.76: Poster
Mittwoch, 26. März 2003, 14:30–17:30, P1
Imaging and patterning of self-assembled monolayers by the zone-plate-focused X-ray beam — •Michael Zharnikov1, Ruth Klauser2, Anne Paul1, Armin Gölzhäuser1, I.-H. Hong2, and Michael Grunze1 — 1Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany — 2Synchrotron Radiation Research Center, Hsinchu, Taiwan
We have explored the potential of soft x-ray photoelectron microscopy for chemical imaging of electron-beam patterned self-assembled monolayers (SAMs) and for microspectroscopic characterization of these systems. Different SAM-derived patterns have been probed - with SAMs serving as a positive resist, a negative resist, or a template for the creation of chemical structures. For all these patterns the lateral structures could be clearly distinguished with either chemical or attenuation-related contrast. The interplay of these contrast mechanisms and inelastic background were found to make the observation of the chemical contrast for low intense photoemission lines especially difficult. Another problem was x-ray damage - the microspectroscopic characterization was only possible with a defocused x-ray beam. On the other hand, due to a profound impact, a strongly focused x-ray beam could be successfully used for the direct patterning of the monomolecular films. In several cases, the observed contrast differed from that for the electron-beam patterned SAMs due to the exposure of the latter patterns to ambience during their transfer into the photoelectron microscope.