Hannover 2003 – scientific programme

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Q: Quantenoptik

Q 49: Poster: Photonik

Q 49.12: Poster

Thursday, March 27, 2003, 16:30–18:30, Lichthof

Fabrication of 2D Photonic Crystals Based on MEMS Opal Hybrid Techniques — •Kai Ludolph, Georgi Georgiev, and Egbert Oesterschulze — Universität Kassel Technische Physik Heinrich-Plett-Str.40 34132 Kassel

The combination of MEMS and photonic crystal structures is still a challenging problem of scientific and industrial interest. A hybrid technique is presented combining self-assembly opal patterning and MEMS based fabrication of 2D photonic crystals on semiconducting materials, in particular silicon. However, for the definition of the crystal geometry, no high resolution lithography process is necessary. First results on hexagonal 2D photonic lattices on silicon as well as layered materials will be presented. Crystal structures with periodicities of yet 500 nm can be achieved with the self-adjusting method that relies on a CMOS compatible ICP plasma etching process. Furthermore, the capability to use the above mentioned surface structure for a soft-lithography process, e.g. molding or µCP, will be discussed. The same method was also exploited to fabricate ultrasmall structures like silicon pillars of up to 2 µm height and 250 nm diameter that might be useful for optical resonator structures. First results also indicate that the same method is generally applicable to III/V semiconductors, e.g. InP, that would open the capability to combine opto-electronics with photonic crystals for communication electronics.