Hannover 2003 – scientific programme

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Q: Quantenoptik

Q 49: Poster: Photonik

Q 49.24: Poster

Thursday, March 27, 2003, 16:30–18:30, Lichthof

Fabrication of 2D photonic crystals by interference lithography — •Karolin Mellert and Harald Giessen — Universität Bonn, Institut für Angewandte Physik, Wegelerstraße 8, D-53115 Bonn

E-beam lithography provides a highly adaptive but time consuming production line, whereas optical interference lithography requires only one step to generate a spatial interference pattern. By exposing a desired interference pattern to a positive-tone photoresist and by etching away the exposed areas one can structure the resist with a chosen pattern. A two-dimensional structure of holes in photoresist arranged on a square lattice is created by using a pulsed frequency doubled Ti:Sapphire laser split into four beams. We are able to achieve uniform structures with a desired duty cycle by changing the energy dosis deposited in the resist. The demonstrated method gives the possibility to create large defect free areas with perfect periodicity. The produced structures may serve as templates to fabricate for example metallic photonic crystals, for instance gold nanodots on top of a waveguiding material. A simulation program clarifies the effects of changing polarization and beam direction on a desired interference pattern and aids to find new interference patterns.