Kiel 2004 – wissenschaftliches Programm
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P: Plasmaphysik
P 16: Niedertemperaturplasmen Plasmatechnologie III
P 16.6: Fachvortrag
Mittwoch, 10. März 2004, 17:05–17:25, H\"orsaal H
Plasma parameter control in diffusion area by grid bias — •Vasile Vartolomei1, Mario Hannemann2, and Rainer Hippler1 — 1Institut für Physik, E.-M.-Arndt Universität Greifswald, Domstraße 10A, D-17487 Greifswald — 2Institut für Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Straße 19, D-17489 Greifswald
The plasma produced by an ECWR (Electron Cyclotron Wave Resonance) discharge was divided using a mesh grid in two parts: plasma source and diffusion (deposition) plasma. The ECWR is an inductively coupled discharge with a superimposed magnetic field (few mT). Langmuir probes and retarding field energy analyser (RFEA) were used to determine the plasma parameters in the diffusion area.
The ion velocity distribution function (IVDF) has a double peak structure. The positions of peaks on the energy scale are determined by plasma potentials in the source (high energy peak) and in the diffusion area (low energy peak). The high energy peak can be moved on the energy scale by changing the voltage on the earth free induction coil.
Additionally, we were able to shift the low energy peak by using the grid bias without practically affecting the high energy peak. However, the advantage of this extra low energy peak mobility on the energy scale was paid by loss in peak’s intensity.
These effects can be explained by the behaviour of plasma density, plasma potential and effective electron temperature with respect to the applied bias on grid.