Regensburg 2004 – wissenschaftliches Programm

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CPP: Chemische Physik und Polymerphysik

CPP 15: POSTER: Polymers and Biomaterials

CPP 15.4: Poster

Dienstag, 9. März 2004, 17:00–19:00, B

Micro-Nanopattern by Block Copolymer Micelle Nanolithography — •Roman Glass¹, Martin Moeller², and Joachim Spatz¹ — ¹Institute for Physical Chemistry, Biophysical Chemistry, University of Heidelberg, Germany — ²Deutsches Wollforschungsinstitut at the RWTH Aachen, Germany

A key issue in the fabrication of functional nanostructures is the defined placement and connection of nanometre sized objects in periodic or aperiodic arrangements on surfaces with different chemical composition and electrical properties. The basis of our approach is the self-assembly of polystyrene-b-poly[2-vinylpyridine (HAuCl4)] diblock copolymer micelles into uniform monomicellar films on solid supports such as Si-wafers or glass cover slips. Subsequent hydrogen plasma treatment of micellar film causes deposition of Au-nanoparticles (between 2 and 8 nm) onto the substrate by entire removal of the polymer. The limitation of the separation distance between individual dots or the pattern geometry is overcome by combining self-assembly of diblock copolymer micelles with pre-structures formed by photo or e-beam lithography. Capillary forces of a retracting liquid film due to solvent evaporation on the pre-structured substrate push micelles in the corners of these defined topographies. A more direct process is demonstrated by applying monomicellar films as negative e-beam resist. This process is also feasible on electrical isolating substrates if the monomicellar film is coated in addition with a 5 nm thick conductive layer of carbon before e-beam treatment.