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Regensburg 2004 – scientific programme

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DS: Dünne Schichten

DS 17: Schichtherstellung II

DS 17.1: Talk

Thursday, March 11, 2004, 15:15–15:30, HS 31

Investigations on the long-time stability of thin PrxOy-films on Si(100) grown by Pulsed Laser Deposition — •Markus Ratzke, Dirk Wolfframm, Mathias Kappa, and Jürgen Reif — LS Experimentalphysik II, BTU Cottbus and JointLab IHP/BTU, Universitaetsplatz 3-4, 03044 Cottbus, Germany

We have studied the long-time stability of thin PrxOy-films on Si(100), produced by Pulsed Laser Deposition from sintered Pr6O11 targets. In particular, the surface morphology and the chemical layer/interface composition were investigated.

For PrxOy films grown at 650 C substrate temperature, we find clear evidence of a change in surface morphology with time after film preparation: while the surface immediately after deposition is characterized by large splashes (mainly Pr2O3) superimposed on a background of mixed oxides (Pr2O3, Pr6O11), after the surface becomes more homogeneous. No similar effect was observed for layers grown at 900 C substrate temperature.

An analysis of XPS spectra (Pr 3d, O 1s, Si 2p) showed that not only the line shape of the Pr 3d and O 1s core level spectra changed but also the Pr 3d/O 1s intensity ratio. This transition of chemical environment suggests the formation of Praseodymium Hydroxide. Since Pr6O11 is well known for its strong hygroscopic behaviour, Pr(OH)3 will preferably be formed between the splashes (Pr2O3), accompanied by the appearance of PrO2.

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