Regensburg 2004 – scientific programme
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DS: Dünne Schichten
DS 22: Postersitzung
DS 22.16: Poster
Tuesday, March 9, 2004, 14:30–17:00, Poster B
Non-conventional plasma sheath diagnostics for thin film deposition — •Holger Kersten1, Ruben Wiese2, and Marcel Haehnel2 — 1INP Greifswald, F.-L.-Jahn-Str.19, D-17489 Greifswald — 2University of Greifswald, Department of Physics, Domstr.10a, D-17487 Greifswald
Plasma and sheath diagnostics of sources used in thin film deposition is an essential issue for optimization and improvement of the related processes (sputtering, PECVD etc.). Often, complicated and expensive diagnostic methods (as mass spectrometry, spectroscopy, Langmuir probes etc.) have to be employed.
However, in certain cases these methods may be completed by relatively simple methods which can reveal information on the densities, energies and fluxes of the involved species, too. Such non-conventional methods are : energy flux measurements by thermal probes, analytical sheath photometry, and sheath diagnostics by charged micro-particles. These procedures will be reviewed and their advantages, but also their disadvantages and limits will be summarized.