Regensburg 2004 – scientific programme
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HL: Halbleiterphysik
HL 12: Poster I
HL 12.55: Poster
Monday, March 8, 2004, 16:30–19:00, Poster A
Regular silicon nano-pillars with high aspect ratios etched via self-organizing nano-porous polymer masks — •Andreas Ladenburger1, Anton Reiser1, Feng Yan2, Johannes Konle1, Werner A. Goedel2, Rolf Sauer1, and Klaus Thonke1 — 1Abt. Halbleiterphysik, Universität Ulm, D-89069 Ulm — 2Abt. Organische Chemie III, Universität Ulm, D-89069 Ulm
We have produced regular silicon pillars with high aspect ratios on the nanometer scale. In the process, first a nano-porous membrane defined by the imprints of self-organizing colloidal particles was created on a silicon wafer. Due to the self-organization the nano-pores form an array with hexagonal ordering. Then a gold film was deposited on the structure and the polymer membrane was removed. The remaining regular pattern of gold disks was used as a mask in a deep reactive ion etching process. The produced nano-pillars are 1.4 µm high and they have diameters less than 200 nm. As a by-product in the creation of the gold mask we obtained a regular gold grid, which can be applied as an optical short pass filter.