Regensburg 2004 – scientific programme
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HL: Halbleiterphysik
HL 15: Photonische Kristalle III
HL 15.10: Talk
Tuesday, March 9, 2004, 12:30–12:45, H17
Functionalized photonic crystals from opals — •Frederik Jonsson1, Patrick Ferrand1, Joerg Seekamp1, Sergei Romanov1, Clivia Sotomayor Torres1, Marc Egen2, and Rudolf Zentel2 — 1Institute of Materials Science and Department of Electrical and Information Engineering, University of Wuppertal, 42097 Wuppertal, Germany — 2Institute of Organic Chemistry, University of Mainz, 55099 Mainz, Germany
Crystallization of opals from colloidal solutions is an easy and effective way to form three-dimensional photonic crystals. While the synthesis of highly crystalline opals is well elaborated, incorporation of opals in optoelectronics circuits assumes precise positioning of opals and embedding artificial defects.
We present the latest achievements on fabrication of opals from poly(methyl methacrylate) (PMMA) microspheres as free standing films and films grown in trenches and cavities on pre-patterned substrates. The quality of opal films was traced as a function of the crystallization method, film thickness and boundary conditions.
Towards the second aim we explored patterning of PMMA opals by means of direct electron-beam lithography. To make it applicable to opals, parameters of e-beam lithography were essentially modified owing to high film thickness, film porosity, opal lattice anisotropy and uncommon pattern depth. The opportunity to prepare buried structures in depth of opals is under investigation.