Regensburg 2004 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

HL: Halbleiterphysik

HL 44: Poster II

HL 44.67: Poster

Donnerstag, 11. März 2004, 16:30–19:00, Poster A

Optical properties of pulsed-laser deposited carbon films — •P.V. Tolstykh¹, S.P. Sernov¹, V.K. Goncharov², M.V. Puzyrou², S. Shokhovets³, and G. Gobsch³ — ¹BNTU Minsk, Skaryna Prosp. 65, 220027 Minsk, Belarus — ²Institute of Applied Physics Problems, Kurchatov Str. 7, 220064 Minsk, Belarus — ³Institute of Physics, TU Ilmenau, PF 100565, 98684 Ilmenau, Germany

Optical properties (refractive index n and extinction coefficient k) in a spectral region from 1.2 eV to 5.5 eV and the thickness d of thin carbon films were determined by spectroscopic ellipsometry and optical transmission measurements. The films were deposited on different substrates (quartz, silicon and bronze) by sputtering of a graphite target placed in a vacuum chamber (residual gas pressure was 1.3 mPa) using a Nd-glass laser with wavelength and pulse duration of 1060 nm and 30 ns, respectively. We studied the dependence of n, k and d on the laser pulse energy (2 J to 8 J, 100 laser pulses) and the substrate temperature (295 K to 500 K) during the deposition. Further, we compare the properties of the studied films with those of amorphous hydrogenated diamond-like and arc-evaporated carbon films and discuss correlations between their optical, structural and mechanical properties, as well as optimum conditions for growing films suitable for different applications.