Regensburg 2004 – scientific programme
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MA: Magnetismus
MA 13: Poster:Schichten(1-23),Spinabh.Trsp(24-41),Exch.Bias(42-56),Spindyn.(57-67),Mikromag.(68-76),Partikel(77-90),Spinelektr.(91-97),Elektr.Theo.(98-99),Mikromag+PhasÜ+Aniso.(100-105),Magn.Mat.(106-118),Messmethod.(119-121),Obflm.+Abbverf.(122-123)
MA 13.73: Poster
Tuesday, March 9, 2004, 15:00–19:00, Bereich A
Stress induced domains in patterned magnetic thick films — •Jeffrey McCord — IFW Dresden, Helmholtzstr. 20, 01169 Dresden
The understanding of domain formation in patterned elements is of great importance for applications in inductive devices. We report on the formation of non-Landau-like domain structures due to magneto-elastic effects in patterned electroplated NiFe and CoNiFe-films with different composition and saturation-magnetostriction varying from 2 to +20x10−6. Novel domain patterns are observed in the 1µm thick structures. No closure domains form in the negative magnetostriction samples. For the first time edge curling walls, known from laminated films, are seen in µm thick single-layer films. Even small changes in composition drastically alter the domain structures in the tensile stressed films. For positive magnetostrictive films, an anisotropy-structured domain pattern is observed. The domain patterns are discussed in terms of stress-induced local anisotropy variations derived from finite-element analysis and confirmed by local anisotropy measurements with µm resolution. Changes with lateral dimensions down to 1µm are shown. The importance of locally induced stress anisotropy for the modeling of magnetic devices will be discussed.