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O: Oberflächenphysik

O 28: Postersitzung (Elektronische Struktur, Grenzfläche fest-flüssig, Halbleiteroberflächen und -grenzflächen, Magnetismus und Symposium SYXM, Methodisches, Nanostrukturen, Oberflächenreaktionen, Teilchen und Cluster, Zeitaufgelöste Spektroskopie)

O 28.59: Poster

Mittwoch, 10. März 2004, 16:00–19:00, Bereich C

Investigation of Au electrodeposition processes on metal single crystal surfaces — •Ahmed Ayyad, Jochim Stettner, and Olaf Magnussen — Institut für Experimentelle und Angewandte Physik, Christian-Albrechts-Universität Kiel, Leibnizstraße 19, 24098 Kiel

Metal electrodeposition processes have been a subject of substantial basic research during the last years, motivated by current technologies as well as future applications, such as the electrochemical formation of ultrathin layers and nanostructures. A major, largely unsettled question is how the electrode surface structure and adsorbates, such as anions or organic additives, influence the growth process. We studied the homoepitaxial electrodeposition of Au on Au(111) electrode surfaces (deposition rates 0.05 to 0.23 ML/min.) by in-situ x-ray diffraction under real time conditions using a hanging-meniscus transmission cell (reduced cell resistance, unrestricted mass transport), where the Au(111) electrode surface is completely covered by an electrolyte droplet. Parallel to the X-ray measurements cyclic voltammograms were recorded, which confirm that the hanging-meniscus cell allows high quality electrochemical measurements combined with in-situ surface X-ray diffraction studies. The X-ray diffraction data and complementary in-situ ellipsometric measurements indicate that the deposition process is accompanied by substantial surface roughening.