Regensburg 2004 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

O: Oberflächenphysik

O 33: Organische Dünnschichten II

O 33.3: Talk

Thursday, March 11, 2004, 11:45–12:00, H39

Using a focused soft X-ray beam for the characterization and fabrication of monomolecular patterns — •Michael Zharnikov¹, Ruth Klauser², Anne Paul¹, Armin Gölzhäuser¹, S.-C. Wang², I.-H. Hong², and Michael Grunze¹ — ¹Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany — ²National Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan (ROC)

We have utilized scanning soft X-ray photoelectron spectromicroscopy to image and characterize different electron-beam patterned self-assembled monolayers (SAMs) on gold substrates. The lateral structures in all SAM-based patterns could be clearly distinguished. The irradiated areas generally revealed a smaller Au 4f intensity and a higher C1s intensity than non-irradiated ones due to the adsorption of airborne carbon-containing molecules on more hydrophilic and rough irradiated areas. Also, chemical changes in some of the resists could be directly monitored as soon as the respective emissions were intense enough as compared to the inelastic background. In addition, we found that the highly intense zone-plate-focused soft X-ray beam can cause non-intentional irradiation-induced modification of the SAMs during the SPEM image acquisition. Taking advantage of this phenomenon, we demonstrate that the X-ray microprobe can be utilized for in-situ surface patterning of the monomolecular SAM resist with subsequent imaging of the fabricated patterns.