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15:45 |
O 40.1 |
Optische Charakterisierung ultradünner Siliziumoxid-Filme mit der Brewster-Winkel Analyse (BWA) — •Michael Lublow und H. J. Lewerenz
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16:00 |
O 40.2 |
On the origin of the STM induced Si(001)c(4×2) – p(2×2) phase transition — •Kaori Seino, Wolf G. Schmidt, Frank Groth, and Friedhelm Bechstedt
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16:15 |
O 40.3 |
Initial and advanced stages of Si dissolution in alkaline media using photoelectron spectroscopy — •Katarzyna Skorupska, Mohammed Aggour, Eder Goncalves, Ralf Hunger, Helmut Jungblut, Michael Kanis, Michael Lublow, Elmar Rüther, Thomas Wilhelm, and Hans-Joachim Lewerenz
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16:30 |
O 40.4 |
In-Situ- and UHV-Investigation of MOCVD-Grown GaAsSb-Interfaces — •Zadig Kollonitsch, Matthias Neges, Kristof Möller, Frank Willig, and Thomas Hannappel
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16:45 |
O 40.5 |
Importance of carrier dynamics and conservation of momentum in atom-selective STM imaging of semiconductor surfaces — •Philipp Ebert, Nikos Jäger, Eicke Weber, and Knut Urban
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17:00 |
O 40.6 |
First-principles calculations for initial adsorption of manganese on Si(001) — •Mahbube Hortaman, Hua Wu, Peter Kratzer, and Matthias Scheffler
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17:15 |
O 40.7 |
Si addimer nanowires on SiC(001) surfaces — •J. Pollmann and P. Krüger
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17:30 |
O 40.8 |
Einfluss photoinduzierter Effekte auf die Photoemissionsspektren gesputterter ZnO-Schichten auf Si(111)-H — •Henning Wolf, Ulrich Meier, Tilo Plake und Christian Pettenkofer
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17:45 |
O 40.9 |
Epitaxial Pr2O3 layers on Si (111) studied with LEED and surface XRD — •Nicole Jeutter, Zarife Özer, and Wolfgang Moritz
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18:00 |
O 40.10 |
Potential Energy Retention of Slow Highly Charged Ar-Ions in Chemical Clean Silicon Surfaces — •Daniel Kost, Stefan Facsko, and Wolfhard Möller
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18:15 |
O 40.11 |
Angle-resolved photoelectron spectroscopy of CuInSe2(001) — •Ralf Hunger, Wolfram Jaegermann, Wolfram Calvet, Carstan Lehmann, Christian Pettenkofer, Keiichiro Sakurai, and Shigeru Niki
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18:30 |
O 40.12 |
Oxide and Carbon contamination removal from semiconductor surfaces using low-energy hydrogen ion beam etching — •Nasser Razek, Axel Schindler, Dietmar Hirsch, and Bernd Rauschenbach
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