Parts | Days | Selection | Search | Downloads | Help
TT: Tiefe Temperaturen
TT 8: Postersitzung I: Supraleitung
TT 8.1: Poster
Monday, March 8, 2004, 14:30–19:00, Poster A
In-situ deposition of MgB2 thin films by magnetron sputtering and thermal evaporation — •R. Schneider, A.G. Zaitsev, J. Geerk, G. Linker, and F. Ratzel — Forschungszentrum Karlsruhe, Institut für Festkörperphysik
We report on two approaches to the in-situ synthesis of superconducting MgB2 thin films. In the first approach, Mg and B were simultaneously sputtered from two separate planar targets. The substrate temperature Ts was limited to a small range of 290 to 320∘C. The resulting films on sapphire substrates were c-axis textured with low growth quality. Their transition temperature Tc reached a maximum of 24 K with a transition width of 0.6 K. A short-time in-situ annealing at 600∘C improved Tc to 28 K. In the second approach, the Mg sputter source was replaced by a specially designed Mg evaporator. Due to this intense Mg source Ts could be increased to 440∘C, and Tc of the ”as-grown” films rose to 33 K. Short-time in-situ annealing after the film deposition enhanced Tc to 36 K. For these films we also measured a high critical current density of 15 MA/cm2 at 6 K.