Berlin 2005 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 16: Dünnschichtanalytik III
DS 16.2: Vortrag
Montag, 7. März 2005, 11:00–11:15, TU HS110
Ultrathin metal film physical properties determined by in situ spectroscopic ellipsometry — •Thomas Oates1, Luke Ryves2, Mykola Vinnichenko1, Marcela Bilek2, and David McKenzie2 — 1Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O.Box 51 01 19, Dresden 01314, Germany — 2Applied and Plasma Physics, School of Physics, University of Sydney, 2006, Australia
Ultrathin and discontinuous metal films have many modern applications, including biosensors, energy efficient windows and temperature sensors. In this paper we present results of real time in situ spectroscopic ellipsometric (SE) determination of the film properties of ultrathin metal films during deposition by PVD. In all cases the film thickness and optical constants are initially evaluated. For thin titanium films the Drude-Lorentz theory is applied to determine the electrical resistance and electron mean free path for films above the percolation threshold. The results are compared with simultaneous in situ DC resistivity measurements. The height and void content of silver island films are determined using SE. Plasmon polariton oscillations are prominent in the optical response and are used to deduce the surface area coverage. Post deposition instabilities (aging) are observed by both SE and resistivity measurements. The aging differs for films before and after the percolation threshold which is determined from the optical constants and confirmed by SEM. Analysis of the SE data suggests the instabilities are due to short term changes in island height followed by longer term changes attributed to chemical and grain size modifications.