Berlin 2005 – scientific programme

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DS: Dünne Schichten

DS 16: Dünnschichtanalytik III

DS 16.9: Talk

Monday, March 7, 2005, 12:45–13:00, TU HS110

Preparation of aluminosilicate crystalline coatings from sol-gel derived alumina films deposited on various silicon/silica substrates — •Emanuel Gutmann, Dirk C. Meyer, Alexander A. Levin, and Peter Paufler — ISP-TU Dresden, Zellescher Weg 16, 01069 Dresden

The dedicated formation of crystalline coatings of the trimorphous aluminosilicates with the composition of Al2SiO5 starting from a low-cost sol-gel deposition of alumina thin films is reported. The influence of substrate type and film thickness on the crystallisation behaviour and film morphology is studied by means of wide-angle X-ray scattering (WAXS) and X-ray reflectometry (XR). When annealed at a temperature of 1150 ^∘C under high-vacuum conditions, formation of the aimed phases was achieved only for films deposited on naturally oxidised Si-substrates covered with a thin silica layer (thickness is about 3 nm). In case of films deposited on amorphous quartz glass and thermally oxidised Si-substrates covered with a thick silica layer (thickness is about 500 nm) no crystallisation occurred at this temperature. After annealing at the higher temperature of 1300 ^∘C under high-vacuum conditions, in the films deposited on both kinds of Si-substrates mullite (Al4SiO8) crystallises together with cristobalite (SiO2) whereas the film deposited on the quartz glass substrate remains amorphous from viewpoint of WAXS.