Berlin 2005 – scientific programme
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DS: Dünne Schichten
DS 20: Schichtwachstum
DS 20.2: Talk
Tuesday, March 8, 2005, 15:30–15:45, TU HS107
Pattern formation in quasi-three-dimensional thin film growth simulations — •Frank Elsholz1, Eckehard Schöll1, Hans Eichler2, and Chris Scharfenorth2 — 1Institut für Theoretische Physik, Technische Universität Berlin, Hardenbergstrasse 36, D–10623 Berlin — 2Optisches Institut, Technische Universität Berlin, Hardenbergstrasse 36, D–10623 Berlin
Growth of thin dielectric films on glass substrates is investigated by means of a quasi-three-dimensional solid-on-solid growth model, which is solved by kinetic Monte-Carlo simulations. While growth of the first layer on a crystalline substrate in epitaxy can by investigated within a two-dimensional growth model without voids or overhangs, thin films with a thickness of several monolayers has to account for vertical diffusion also. We propose a new quasi-three-dimensional model which allows for simulating growth of several hundreds of nanometer film thickness at considerable simulation system size of 200×200 nm2 even at lower available computer memory resources. Theoretical and experimental results are compared to each other, discovering three stages of thin film growth.