Berlin 2005 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 23: Postersitzung I
DS 23.27: Poster
Freitag, 4. März 2005, 16:00–18:30, Poster TU B
Deposition and characterization of Ag clusters on a Si(100) substrate — •Ibrahimkutty Shyjumon1, Manesh Gopinadhan1, Marion Quaas2, Harm Wulff2, Christiane A. Helm1, and Rainer Hippler1 — 1Institut für Physik, Ernst-Moritz-Arndt-Universität Greifswald, Domstraße 10a, 17489 Greifswald, Germany — 2Institut für Chemie und Biochemie, Ernst-Moritz-Arndt-Universität Greifswald, Soldmannstraße 16, 17489 Greifswald, Germany
Nano size Ag clusters are produced by direct current magnetron sputtering followed by gas aggregation. The charged clusters are directed and deposited on a Si(100) substrate which is biased followed by a lens system. Films prepared at different substrate voltage are analysed by AFM and GIXD methods. AFM results show a pronounced decrease in cluster height and some indication for an increase in cluster width for increasing substrate voltage that can be inferred as a clear indication of cluster flattening upon impact on the surface. This result is supported by GIXD results, where the measured interplanar spacing as well as linear thermal expansion coefficient points towards flattened clusters. Deposited films are futher analysed by XPS and UV-Visible absorption techniques to obtain the chemical composition and physical properties of the films.