Berlin 2005 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 24: Postersitzung II

DS 24.25: Poster

Dienstag, 8. März 2005, 17:00–19:00, Poster TU B

Mechanism of pulsed laser deposition of PMMA — •Erik Süske¹, Thorsten Scharf¹, Thomas Junkers², Michael Buback² und Hans-Ulrich Krebs¹ — ¹Institut für Materialphysik, Universität Göttingen, Friedrich Hund-Platz 1, 37077 Göttingen — ²Institut für Physikalische Chemie, Universität Göttingen, Tammannstraße 6, 37077 Göttingen

Polymer thin films of sub-micrometer thickness of poly (methyl methacrylate) (PMMA), polytetrafluorethylene (PTFE) or polyethylene (PE) are attractive coating materials. Desirable hardness and wear resistance are mostly obtained by cross-linking polymer films. The pulsed laser deposition offers a versatile method to grow thin PMMA films which consist of two components, one fraction with a molecular weight well below that of the target material and a second fraction, which is cross-linked. Both, the molecular mass and the amount of cross-linking are tunable by the deposition parameters as substrat temperature and laser fluence which gives the opportunity to deposit films with excellent properties. In this contribution, the deposition mechanism of PMMA is discussed with respect to characteristics as microstructure, chemical composition and mechanical properties.