Berlin 2005 – wissenschaftliches Programm
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HL: Halbleiterphysik
HL 49: Photonische Kristalle II
HL 49.10: Vortrag
Dienstag, 8. März 2005, 13:00–13:15, TU P164
Silicon double inversion of polymeric templates: a route towards functional 3D photonic band gap materials — •Georg von Freymann1, Nicolas Tétreault1, Geoffrey A. Ozin1, Markus Deubel2,3,4 und Martin Wegener2,3,4 — 1Materials Chemistry Research Group, Department of Chemistry, University of Toronto, M5S 3H6, Toronto, Canada — 2Institut für Angewandte Physik, Universität Karlsruhe (TH), 76128 Karlsruhe — 3Institut für Nanotechnologie, Forschungszentrum Karlsruhe, 76021 Karlsruhe — 4CFN, Universität Karlsruhe (TH), 76128 Karlsruhe
We present the successful silicon double inversion of three-dimensional polymeric templates for Photonic Crystals.
In a first step, the high-quality polymer template [1] is infiltrated via a room temperature silica chemical vapor deposition (CVD) process. Plasma etching and thermal combustion subsequently remove the original polymer template. In a second step, the silica template is infiltrated with silicon via Si-CVD with disilane as a precursor. The silica backbone is finally removed by wet chemical etching, leaving behind a replica of the original polymer template cast in silicon. In combination with plasma treatment [2] of the original template, our method opens a facile way for the production of large scale functional 3D Photonic Crystals at telecommunication wavelengths.
[1] M. Deubel et al., Nature Materials 3, 444 (2004)
[2] G. von Freymann et al., Photonics and Nanostructures, in press (2004)