Berlin 2005 – wissenschaftliches Programm
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HL: Halbleiterphysik
HL 49: Photonische Kristalle II
HL 49.9: Vortrag
Dienstag, 8. März 2005, 12:45–13:00, TU P164
High quality polymer opals as photonic crystals — •Rudolf Zentel1, Jianhui Ye1, Birger Lange1, Friederike Fleischhaker1, Marc Egen1, Frederik Jonsson2, Sergei Romanov2, and Clivia Sotomayor Torres2 — 1Fachbereich Chemie, Duesbergweg 10-14, Universität Mainz, D-55099 Mainz, Germany — 2NMRC, Lee Maltings,, Prospect Row, Cork, Ireland
Polymer opals, which are self-assembled from solution, can be made easily, over large areas and with relatively low cost. A possible use of these materials as 3D photonic crystals is -so far- limited by the quality of the crystalline packing and by their refractive index contrast. The refractive index contrast necessary for a "full band gap" might be achievable by the preparation of high refractive index inorganic replica. We want to address here (I) the aspect of the quality of the crystal lattice and (II) the patterning of opaline materials. Concerning the crystal quality (I) we can show that by optimizing the synthesis of colloidal particles (this leads to highly monodisperse colloids) and the crystallization procedure at the same time, large (cm size) high quality colloidal crystals can be obtained. Also heterostructures with different crystal parameters are accessible. Concerning the patterning of opals (II) E-beam lithography can be used for all PMMA based systems. This allows it even to inscribe artificial defects into polymer opals. Also photoprocessable polymer opals are now at hand. Alternatively it is possible to direct the crystallization of the colloids on a substrate to the desired places. This makes it possible to integrate 3D photonic structures into a complex 2D pattern.