Berlin 2005 – scientific programme
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HL: Halbleiterphysik
HL 54: Photonische Kristalle III
HL 54.1: Talk
Tuesday, March 8, 2005, 15:00–15:15, TU P164
Laser Direct Writing of three-dimensional Photonic Crystals in high-index of refraction chalcogenide glasses — •Sean Wong1, Georg von Freymann1, Geoffrey A. Ozin1, Markus Deubel2,3,4 und Martin Wegener2,3,4 — 1Materials Chemistry Research Group, Department of Chemistry, University of Toronto, M5S 3H6, Toronto, Canada — 2Institut für Angewandte Physik, Universität Karlsruhe (TH), 76128 Karlsruhe — 3Institut für Nanotechnologie, Forschungszentrum Karlsruhe, 76021 Karlsruhe — 4CFN, Universität Karlsruhe (TH), 76128 Karlsruhe
We present a two-step method for the direct fabrication of high-index of refraction three-dimensional Photonic Crystals.
Direct laser writing [1] in arsenic-sulphur based thin films of chalcogenide glasses with high-intensity 120fs pulses induces a local chemical phase change via two-photon absorption to As2S3. The inscribed three-dimensional Photonic Crystals are subsequently etched out with a specially designed wet chemical etchant. In principle, the index of refraction of As2S3 (n=2.45) is high enough to open a complete band gap in diamond-like crystal structures, e.g. the woodpile structure, although further optimization of the writing process is required to achieve this goal. As our approach does not require any subsequent inversion with high index material, it might prove as a new route for the direct fabrication of functional Photonic Crystals.
[1] M. Deubel et al., Nature Materials 3, 444 (2004)