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HL: Halbleiterphysik

HL 58: Poster IIb

HL 58.26: Poster

Dienstag, 8. März 2005, 16:30–19:00, Poster TU F

Fabrication of templates and 3D nanostructuring of positive photoresists — •Sven Passinger, Carsten Reinhardt, and Boris Chichkov — Laserzentrum Hannover e.V., Hollerithallee 8, 30419 Hannover

So far, two-photon polymerization technique has been applied for the fabrication of photonic crystal structures only in negative photoresists. These materials have relatively low refractive index and, due to their high chemical stability, it appears difficult to use them as templates for the realization of high refractive index replicas.

In this contribution, positive photoresist S1813 (which can be easily removed) is used for the first time for the fabrication of photonic crystal templates. 3D nanostructuring of positive photoresist by two-photon irradiation technique is studied. We will report on resolution limits, first 3D photonic crystal structures fabricated by these methods, and their properties.