Berlin 2005 – scientific programme
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MA: Magnetismus
MA 19: Mikro- und nanostrukturierte magn. Materialien I
MA 19.7: Talk
Monday, March 7, 2005, 12:00–12:15, TU EMH225
Anisotropy patterning of amorphous CoFeSiB films by He-ion irradiation — •Jeffrey McCord1, Jürgen Fassbender2, Michael Frommberger3, Maciej Oskar Liedke2, Eckhard Quandt3, and Ludwig Schultz2 — 1Leibniz Institute for Solid State and Materials Research Dresden - Institute for Metallic Materials - 01169 Dresden — 2FZ Rossendorf - Institut für Ionenstrahlphysik und Materialforschung - 01314 Dresden — 3Stiftung caesar - Smart Materials Laboratory - 53175 Bonn
The alteration of magnetic properties in magnetic thin films by ion radiation has gained increasing attention in recent years. Here, we present data on the local alteration of the magnetic anisotropy axis in amorphous soft magnetic FeCoBSi films by He-ion irradiation in an applied magnetic in-plane field. Sputtered CoFeSiB (thickness 30 nm) were irradiated with 5 keV He-ions. A magnetic field of 600 Oe was applied during irradiation aligned orthogonal to the initial easy axis of anisotropy. Above a critical fluence an alignment of anisotropy in the applied field direction is observed by MOKE magnetometry and complementary domain observation by Kerr microscopy. Using irradiation together with photolithography the films were irradiated locally, thus resulting in anisotropy-patterned structures. Domain patterns in different elements with varying angles of anisotropy and edge orientation, separating regions of different anisotropy alignment, are shown. The influence of the patterning on the (still) full film reversal is discussed in detail.