Berlin 2005 – wissenschaftliches Programm

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MA: Magnetismus

MA 20: Poster:Schichten(1-29),Spintrsp(30-45),Ex-Bias(46-63),Spindyn(64-75),Mikromat.(76-80),Cluster(81-94),Abbv.(95-99),Obflm(100-02),SpElek.(103-09),E-Theo(110-14),Mikromag.(115-16),Spin+PÜ(117-26),Mag.Mat.(127-51),Meth.(152-55),Mol.Mag(156-59),Kondo(160-65

MA 20.49: Poster

Montag, 7. März 2005, 14:00–18:00, Poster TU C

AF thickness dependence of the 10keV He-ion bombardment induced exchange-bias modification in multilayers containing MnIr as antiferromagnet — •T. Weis, D. Junk, D. Engel, A. Ehresmann, V. Höink, J. Schmalhorst, and G. Reiss — tanja-jacob@web.de

It is known that the exchange bias field H_eb of antiferromagnet/ferromagnet (AF/F) bilayers can be modified by keV He-ion bombardment in an external magnetic field. The modification of the magnitude and the direction of H_eb is dependent on the He-ion dose and the direction of the external magnetic field applied during the ion bombardment.

In this contribution the AF layer thickness dependence of keV He-ion bombardment induced modifications of H_eb in magnetic multilayers with MnIr as AF and CoFe or Co as F was investigated. It was found that the ion dose dependence of H_eb is strongly influenced by the IrMn layer thickness. First experimental results for varying AF thicknesses will be presented.