Berlin 2005 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

MA: Magnetismus

MA 20: Poster:Schichten(1-29),Spintrsp(30-45),Ex-Bias(46-63),Spindyn(64-75),Mikromat.(76-80),Cluster(81-94),Abbv.(95-99),Obflm(100-02),SpElek.(103-09),E-Theo(110-14),Mikromag.(115-16),Spin+PÜ(117-26),Mag.Mat.(127-51),Meth.(152-55),Mol.Mag(156-59),Kondo(160-65

MA 20.78: Poster

Montag, 7. März 2005, 14:00–18:00, Poster TU C

Magnetic domain structure of micro-patterned PtMn/CoFe exchange bias bilayers — •M.O. Liedke^1,2, K. Potzger¹, B. Hillebrands², M. Rickart³, P. Freitas³, and J. Fassbender¹ — ¹FZ Rossendorf, Institut für Ionenstrahlphysik und Materialforschung, 01314 Dresden — ²Fachbereich Physik, TU Kaiserslautern, 67663 Kaiserslautern — ³INESC MN, 1000 Lisabon, Portugal

Using magnetron sputtering deposition a number of high exchange bias field samples were prepared for magnetic pattering investigations. The system prepared is as follow: glass/Ta 70 Å/PtMn 200 Å/ t_CoFe = 20 - 60 Å/Ta 40 Å. One of such bottom pinned samples with 40 Å of CoFe was used for optical lithography. Several patterns have been etched physically with decreasing lateral sizes of either the edges or the spacing between the elements. The largest square is 50 × 50 µm and the smallest only 1 µm². The separating lines are ranging from 10 µm to 2 µm width. The magnetic characterization of the samples have been done by VSM and MOKE. All samples exhibit well defined exchange bias field. A series of MFM images were taken from the structures. All images show a monodomain magnetization state in zero magnetic field. The shape of the structure itself dose not influence stray field direction. The shape anisotropy contribution is thus smaller than the unidirectional anisotropy given by the exchange bias. MFM investigation in an applied magnetic field have been done to get a deeper understanding of the domain pattern.