Berlin 2005 – wissenschaftliches Programm
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O: Oberflächenphysik
O 15: Postersitzung (Adsorption an Oberfl
ächen, Epitaxie und Wachstum, Organische Dünnschichten, Oxide und Isolatoren, Rastersondentechniken, Zeitaufgelöste Spektroskopie, Methoden)
O 15.25: Poster
Freitag, 4. März 2005, 17:00–20:00, Poster TU D
Electrospray ion beam deposition in UHV: experimental development and first results — •Stephan Rauschenbach1, Frank Stadtler1, Egenio Lunedei1, Sergei Koltsov2, Nicola Malinovski1, Giovanni Costantini1 und Klaus Kern1 — 1Max-Planck-Institut für Festörperforschung, D-70569 Stuttgart — 2Institute for Analytical Instrumentation, Russian Academy of Sciences, 19813 Saint Petersburg
To avoid the intrinsic limitations in vapor deposition of organic molecules a novel ion beam source using Electro Spray Ionization (ESI) was constructed. The single molecular particle beam is formed from charged droplets due to iterative Coulomb explosion. High- and low-pressure radio frequency (RF) quadrupoles and electrostatic ion optics guide the ion beam through four differential pumping stages from ambient pressure to 10−6 mbar at the substrate position.
The composition of the ion beam can be adjusted using the quadrupole ion guides as mass filters. Beam properties, particularly kinetic energy, mass and spatial distribution were characterized. The incidence energy could be measured between 5eV and 20eV per charge. A time-of-flight mass spectrometer was integrated.
Particle beams produced by the ESI source were used in a preliminary deposition setup in high vacuum. The samples were analyzed with atomic force microscopy (AFM) under ambient conditions. Organic molecules (Rhodamin m=443 amu) and Albumin (BSA, m=66000 amu) as well as Gold colloids (diameter=3.6-6.5 nm) were deposited on highly ordered pyrolytic graphite (HOPG) or Silicon substrates.