Berlin 2005 – wissenschaftliches Programm

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O: Oberflächenphysik

O 15: Postersitzung (Adsorption an Oberfl
ächen, Epitaxie und Wachstum, Organische Dünnschichten, Oxide und Isolatoren, Rastersondentechniken, Zeitaufgelöste Spektroskopie, Methoden)

O 15.31: Poster

Freitag, 4. März 2005, 17:00–20:00, Poster TU D

Fabrication of well-defined nickel films on self-assembled monolayers — •Yian Tai, Andrey Shaporenko, Wolfgang Eck, Michael Grunze, and Michael Zharnikov — Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany

Self-assembled monolayers (SAMs) suit well as model organic surfaces for metal evaporation experiments. In addition, the fabrication of metal wires on SAM surface is an important issue for future molecular electronics. The major difficulty in fabricating well-defined metallic films on the SAM surface is the penetration of metal atoms into the SAM and to the SAM-substrate interface. Taking nickel as a test adsorbate, we showed that this process can be partly suppressed through the fictionalization of SAMs with a reactive tail group. The full suppression has been achieved by a combination of the SAM fictionalization and electron-induced cross-linking of the molecular layer - a well-defined and stable nickel film on the SAM support could be fabricated. In addition, several interesting effects were observed including a non-homogeneous irradiation-induced cross-linking within a SAM and a drastic decrease in molecular tilt of the SAM constituents at the initial stage of the Ni deposition on thiol-terminated aromatic SAMs. The latter effect was attributed to the formation of Ni-thiol complexes at the SAM-ambient interface.