Berlin 2005 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

O: Oberflächenphysik

O 15: Postersitzung (Adsorption an Oberfl
ächen, Epitaxie und Wachstum, Organische Dünnschichten, Oxide und Isolatoren, Rastersondentechniken, Zeitaufgelöste Spektroskopie, Methoden)

O 15.32: Poster

Freitag, 4. März 2005, 17:00–20:00, Poster TU D

Spectroscopy and microscopy studies for the development of lithography with a monomolecular resist — •Michael Zharnikov¹, Andrey Shaporenko¹, Anne Paul¹, Armin Gölzhäuser², and Andreas Scholl³ — ¹Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany — ²Physik Supramolekularer Systeme, Universität Bielefeld, Universitätsstr. 25, 33615 Bielefeld, Germany — ³Advanced Light Source, Lawrence Berkeley National Laboratory, CA 94720, USA

Soft X-ray absorption microscopy was applied to image and characterize molecular patterns produced by electron irradiation of aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs) on Au substrates. The measurements were performed at all relevant absorption edges. The fabricated patterns could be clearly imaged with a lateral resolution better than 150 nm, which, e.g., allowed to distinguish a fine structure of 1 µm features. The X-ray absorption microspectra derived from different areas of the SAM patterns provided specific chemical information on pristine and irradiated areas, and unexpected features in these patterns. The quality of the microspectra is comparable with that of the analogous X-ray absorption spectra acquired with a standard equipment from homogeneous SAMs. In particular, a chemical transformation of the functional tail groups within the irradiated areas of the patterned aromatic SAMs could be directly monitored.