Berlin 2005 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

O: Oberflächenphysik

O 15: Postersitzung (Adsorption an Oberfl
ächen, Epitaxie und Wachstum, Organische Dünnschichten, Oxide und Isolatoren, Rastersondentechniken, Zeitaufgelöste Spektroskopie, Methoden)

O 15.42: Poster

Freitag, 4. März 2005, 17:00–20:00, Poster TU D

Laser induced local decomposition of octadecylsiloxane monolayers: Patterning in an ultra-high vacuum environment — •Rafael Bautista Mester, Thorsten Balgar, Nils Hartmann und Eckart Hasselbrink — Universität Duisburg-Essen, Campus Essen, Fachbereich Chemie, Universitätsstr. 5, 45141 Essen

A procedure for direct patterning of octadecylsiloxane (ODS) monolayers has been developed. Silicon substrates were coated with ODS in a millimolar solution of octadecyltrichlorosilane [1]. Subsequently, patterning was carried out at ambient conditions using a highly focused laser beam of an argon ion laser operated at 514 nm [2]. In order to investigate the specific role of oxygen and water in the overall patterning process additional experiments were carried out at well-defined conditions in an ultra-high vacuum environment. Similar to the results at ambient conditions here structures with lateral dimensions well below the laser spot diameter can be prepared. A general mechanism of the patterning process is discussed.

[1] Th. Balgar, R. Bautista, N. Hartmann and E. Hasselbrink, Surf. Sci. 532-535 (2003) 963.

[2] N. Hartmann, Th. Balgar, R. Bautista, S. Franzka and E. Hasselbrink, Proc. SPIE 5223 (2003) 9.