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O: Oberflächenphysik
O 15: Postersitzung (Adsorption an Oberfl
ächen, Epitaxie und Wachstum, Organische Dünnschichten, Oxide und Isolatoren, Rastersondentechniken, Zeitaufgelöste Spektroskopie, Methoden)
O 15.77: Poster
Freitag, 4. März 2005, 17:00–20:00, Poster TU D
Force microscopy analysis of etch pits for crystal defect assignment — •Christian Motzer und Michael Reichling — Fachbereich Physik, Universität Osnabrück, Barbarastr. 7, 49069 Osnabrück
Ex-situ scanning force microscopy analysis of etched (111) CaF2 cleavage plates were carried out to study crystal defects. Etch figures are well known to be related to certain crystal defects and were studied by several microscopy methods to determine the etch pit density (EPD) which relate to the dislocation density in a crystal. Force microscopy enables us to investigate in detail the etch figures and reveal more than the occurance of dislocation etch pits. We found several types of etch pits which relate to different kinds of defects. Point bottom etch pits and flat pits are discussed in relation to their crystal defect origins. Segregation connected with dislocations alter the kinetic during dissolution and hence change the appearance of etch pits, e.g. etch pits appear with multiple inner walls.