Berlin 2005 – scientific programme
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O: Oberflächenphysik
O 46: Adsorption an Oberfl
ächen V
O 46.1: Talk
Tuesday, March 8, 2005, 15:45–16:00, TU EB420
Investigation of water adsorption on different low index ZnO surfaces — •Tilo Plake, Stefan Andres, and Christian Pettenkofer — Hahn-Meitner-Institut, Glienicker Straße 100, 14109 Berlin
The influence of Zn(OH)x is reported to play a considerable role regarding the electronical properties of ZnO semiconductor structures. We present x-ray and ultraviolet photoelectron spectroscopy data of ZnO (0001), (0001), (1010), and (1120) surfaces that have been cleaned under ultrahigh vacuum conditions by Ar+ sputtering and subsequent annealing. Adsorption of H2O is performed on the samples which have been cooled down to 77 K. Temperature is gradually raised until all water desorbes completely. The changes in the spectral emissions are discussed with respect to the formation of a hydroxide capping. Alternatively, samples are exposed to water at temperatures ranging from 300 K to 600 K. Adsorbate spectra are compared to data obtained from hydroxide exposed samples. Decomposition of Zn(OH)x to ZnO and H2O during annealing is monitored and compared to data obtained from polycrystalline samples.