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Berlin 2005 – scientific programme

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O: Oberflächenphysik

O 48: Oxide und Isolatoren II

O 48.4: Talk

Tuesday, March 8, 2005, 16:30–16:45, TU EB107

Structural Studies of thin VOx films grown on TiO2 using NIXSW — •Emily Kröger1, Francesco Allegretti2, Martin Polcik1, Matthew Knight2, Vin Dhanak3, and Phil Woodruff1,21Fritz-Haber-Institut, Faradayweg 4-6, 14195, Berlin — 2Department of Physics, University of Warwick, Coventry CV4 7AL, UK — 3Daresbury Laboratory, UK

The aim of this project is to use quantitative structural techniques to obtain information on transition metal oxide surfaces. The Normal Incidence X-Ray Standing Waves (NIXSW) technique is used to investigate the growth of sub-nanometre vanadia films on the rutile titanium dioxide (110) surface. The bulk NIXSW structural parameters for TiO2 have been successfully fitted. Three different Bragg reflections were used to triangulate the V atom positions and epitaxial film growth for vanadia films grown by post-oxidation has been confirmed. The measurements allowed the decrease in film quality with film thickness to be monitored. In addition, a series of experiments on as-deposited sub-monolayer films were completed. Two components in the X-ray photoelectron spectrum of the V 2p suggest two different V species on the surface and this NIXSW study shows that they take different surface positions.

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