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O: Oberflächenphysik

O 55: Epitaxie und Oberfl
ächenreaktionen

O 55.2: Vortrag

Mittwoch, 9. März 2005, 11:00–11:15, TU EB107

A kmc study of the steering effect in Cu(001) homoepitaxy — •Frits Rabbering, Herbert Wormeester , and Bene Poelsema — MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands

One of the key assumptions in the description of growth is the homogeneous distribution of the incoming particle flux. The analysis of high resolution LEED measurements after the deposition of 40 ML of Cu on Cu(001) at various polar deposition angles led to the conclusion that attractive forces between the surface and the incoming particle have a dramatic effect on the trajectory of the incoming particle, called steering [1]. The result of the steering effect is that incoming particles are attracted towards protruding structures. This leads to an increased roughening with pronounced changes in morphology for glancing incidence deposition. The steering effect introduces two additional parameters in the growth process: the polar angle of incidence and the velocity of the incident particles. We developed a Kinetic Monte Carlo program that describes well the growth at normal incidence (only small influence of steering). The first results on the influence of both polar incidence angle and the velocity of the incoming particles on the growth morphology in the temperature range of 180 to 250K will be presented. [1] S. van Dijken, L.C. Jorritsma and B. Poelsema, Phys. Rev. Lett. 82 4038 (1999)