Berlin 2005 – scientific programme

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P: Plasmaphysik

P 6: Diagnostik 2

P 6.1: Fachvortrag

Friday, March 4, 2005, 14:45–15:15, HU 3059

Self excited electron resonance spectroscopy - Fundamentals and industrial applications in RF plasmas — •Michael Klick — ASI Advanced Semiconductor Instruments GmbH, Rudower Chausse 30, 12489 Berlin

In particular the semiconductor industry requires robustness, repeatability of plasma parameters measurement for production control and plasma process understanding for chamber design and process development. The Self Excited Electron Resonance Spectroscopy (SEERS) is based on a passive measurement of the RF discharge current and a discharge model. The nonlinear characteristic of the RF driven boundary sheath, the resultant generation of harmonics in the discharge current, and the plasma oscillations at the ’geometric’ resonance frequency below the spatially averaged electron plasma eigenfrequency are the fundamentals of the underlying theory. The model and an appropriate broad-band RF current measurements allow to measure the electron density as well as the effective collision rate of the electrons. The detection and utilization of plasma physical mechanisms as stochastic heating of electrons in production chambers and a review of results in the high-volume semiconductor production show the manifold of applications.