Berlin 2005 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

SYBN: Biological and Social Networks

SYBN 3: Biologische und Soziale Netzwerke, Postersitzung

SYBN 3.22: Poster

Monday, March 7, 2005, 14:00–15:30, Poster TU E

Reversible Chemical Patterning On Stimuli Responsive Polymer Film - Environment Responsive Lithography — •Leonid Ionov¹, Sergiy Minko ², Manfred Stamm ¹, Jean-Francois Gohy³, Robert Jerome ³, and Andreas Scholl ⁴ — ¹Leibniz Institute of Polymer Research Dresden, Germany — ²Clarkson University, Chemistry Department, Potsdam, USA — ³Centre for Education and Research on Macromolecules (CERM), University of Liège, Sart-Tilman, Belgium — ⁴Lawrence Berkely National Laboratory, USA

This paper aims is reporting on a novel type of lithography based on thin stimuli responsive polymer films. The basic concept is the permanent storage of a pattern, which is reversibly developed and erased upon exposure to appropriate environments, e.g. solvent, pH and temperature. This technique is promising for the design of smart sensors and nanodevices, and in microfluidic technologies. The general concept of this novel type of environment-responsive lithography will be presented and discussed.