Berlin 2005 – scientific programme
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SYFS: Nichtflüchtige Festkörperspeicher
SYFS 3: Magnetic memories
SYFS 3.2: Talk
Saturday, March 5, 2005, 16:15–16:30, TU HE101
From self-ordering towards imprint lithography: Large scale periodic nickel and permalloy nanowire arrays — •Kornelius Nielsch1, Woo Lee1, Ulrich Gösele1, Ralf B. Wehrspohn2, David Navas 3, and Manuel Vázquez3 — 1Max Planck Institute of Microstructure Physics, Halle — 2Department of Physics, University of Paderborn — 3Instituto de Ciencia de Materiales de Madrid, CSIC, Cantoblanco, Spain
In recent years magnetic arrays have attracted a lot of interest due to their potential application for perpendicular patterned magnetic media. Ni and Ni80Fe20 nanowires have been used due to the small magneto-crystalline anisotropy and a large anisotropy resulting from the wire shape. We will analyze the impact of the nanowire arrangement on the total anisotropy of the magnetic arrays and the deviation of the switching fields of individual nanowire with a disordered, polycrystalline and monocrystalline nanowire arrangement. Self-ordered alumina pore channel arrays are used partly as templates for the fabrication of magnetic nanowire arrays with a periodicity of 65, 100, and 500 nm. In analogy to polycrystallites, the nanowires are hexagonally arranged in domains, which are extended over more than ten lattice periods. We obtain a perfect hexagonal or monocrystalline arrangement on a cm2-scale, when we introduce imprint lithography in the fabrication process of our magnetic arrays. We observe that the total magnetic anisotropy increases by either reducing the deviation in nanowire diameter or by improving the ordering of the nanowire arrangement.