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VA: Vakuumphysik und Vakuumtechnik
VA 3: Vakuumverfahren und Komponenten 1
Monday, March 7, 2005, 14:00–15:30, TU E20
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14:00 | VA 3.1 | Invited Talk: Gated Electron Source with CNT Field Emitter for Vacuum Triode Application — •Wolfram Knapp and Detlef Schleußner |
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14:30 | VA 3.2 | Shutter-transients during solid-source epitaxy — •Christian Heyn and Sabine Cunis |
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14:50 | VA 3.3 | Inductively coupled HF Plasma beam source for Ion beam assisted deposition in a boxcoater — •M. Klosch, H.-J. Eifert, H. Hagedorn, and R. Beckmann |
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15:10 | VA 3.4 | Solarthermische Vakuumpyrolyse von Oxidmineralen — •Markus Sauerborn |