Augsburg 2006 – scientific programme

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P: Plasmaphysik

P 10: Niedertemperaturplasmen / Plasmatechnologie 3

P 10.2: Talk

Tuesday, March 28, 2006, 11:45–12:00, 1002

Numerical analyses and studies of electron temperature and density distributions in a capacitive coupled neutral loop discharge plasma (CCP-NLD) via PIC Simulation — •Murat Vural and Ralf Peter Brinkmann — Lehrstuhl für Theoretische Elektrotechnik, Ruhr-Universität-Bochum, D-44780 Bochum, Germany

Plasma etching technologies for fabrication of ultra-large scale integrated circuits (ULSI) require uniformity over large wafer sizes. In order to maximize the etching uniformity, a few years ago, magnetic neutral loop discharges (NLD), a new plasma source to realize very uniform processing with a plasma ring was presented and a preliminary experiment demonstrated the usefulness of NLD for etching process.

Three magnetic coils placed coaxially outside the cylindrical vacuum chamber are used to produce a neutral loop (NL) inside the chamber. The CCP-NLD plasma is generated by applying an RF electric field vertical to direction across the magnetic neutral loop. In this work, particle-in-cell (PIC) simulation results of CCP-NLD plasma are presented. The PIC code is used to investigate spatially and temporally resolved simulation results of the electron density and energy distribution for different gas pressures and external magnetic fields.