Augsburg 2006 – scientific programme
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P: Plasmaphysik
P 4: Diagnostik 1; Niedertemperaturplasmen / Plasmatechnologie 2; Magnetischer Einschluß 2
P 4.14: Poster
Monday, March 27, 2006, 17:00–19:00, Flure
Characterisation of single and dual frequency capacitively coupled RF plasmas using SEERS and Langmuir probe measurements — •Egmont Semmler1, Michael Kijowski1, Peter Awakowicz1, Achim von Keudell2, and Ralf-Peter Brinkmann3 — 1Ruhr-Universität Bochum, Lehrstuhl AEPT, Universitätsstrasse 150, D-44801 Bochum — 2Ruhr-Universität Bochum, Arbeitsgruppe AG2, Universitätsstrasse 150, D-44801 Bochum — 3Ruhr-Universität Bochum, Lehrstuhl TET, Universitätsstrasse 150, D-44801 Bochum
Dual frequency capacitively coupled rf plasmas are an increasingly used tool in semiconductor production. The advantage of this kind of discharge is the independent control of the ion flux generated in the plasma bulk and the impact ion energy on the substrate. Furthermore the increased homogeneity of the capacitive geometry itself is a significant advantage compared to inductively coupled plasmas or magnetron cathodes, especially in production of large area flat panel displays.
The measurement setup is a dual-/triple-frequency capacitively coupled plasma chamber and is equipped with the Self Excited Electron Resonance Spectroscopy (SEERS) System Hercules(C) (ASI GmbH, Berlin) and the Langmuir Probe System APS3. All presented measurements were performed for both single and dual frequency plasma operation. The influence of generator power and chamber pressure variation has been studied with SEERS and Langmuir probe diagnostics. In future work the results of both diagnostic tools will be compared to model simulations of dual frequency capacitively coupled rf discharges. This work is supported by the No-dqDFG Sonderforschungsbereich 591No-dq subproject B8.