Augsburg 2006 – scientific programme
Parts | Days | Selection | Search | Downloads | Help
P: Plasmaphysik
P 4: Diagnostik 1; Niedertemperaturplasmen / Plasmatechnologie 2; Magnetischer Einschluß 2
P 4.2: Poster
Monday, March 27, 2006, 17:00–19:00, Flure
Determination of plasma parameters during deposition of ZnO films with ceramic and metallic targets and correlation with film properties — •Ruben Wiese1, Holger Kersten1, Florian Ruske2, Volker Sittinger2, and Richard Menner3 — 1INP Greifswald — 2Fraunhofer IST Braunschweig — 3ZSW Stuttgart
In sputtering of ZnO films the physical properties of the deposited films are essentially determined by the plasma parameters. In the present case the energy flux to the substrate was measured with special thermal probes. A thermally isolated substrate dummy was placed in the magnetron plasma at the substrate position. By the thermal behaviour of the probe one can determine the energy flux to the surface. Furthermore it is possible to apply a substrate bias which allows the estimation of the energy flux by charged particles.
To determine further plasma parameters Langmuir-probes were placed in the substrate region. The probes could be moved across the target axis and thus the distribution of plasma parameters across the target could be determined.
Films were deposited onto stationary substrates at comparable sputter conditions to determine film properties across the target axis. With the deposition rate a key parameter, the energy influx per condensed particle, could be determined and compared to film properties.
The measurements have been carried out on different in-line coaters using both sputtering of ceramic targets and reactive sputtering of metallic targets.