Dresden 2006 – scientific programme

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CPP: Chemische Physik und Polymerphysik

CPP 1: Thin Films and Surfaces I

CPP 1.7: Talk

Monday, March 27, 2006, 11:30–11:45, ZEU Lich

Deformation of polymer thin films on structured substrates — •Julien Leopoldes and Pascal Damman — Laboratoire de Physico-Chimie des Polymères, 20 Place du Parc, B7000 Mons

Polymer surface patterning is a crucial issue for many technological applications such as the manufacture of memory storage devices, catalyse, biomimetics or microfluidics. Various techniques are available, mainly based on lithography. It is however unanimously acknowledged that new routes toward the self-assembling of chemical and/or topographical patterns are urgently needed, to reduce the cost and accelerate the progress of the development of the micro and nano structuring processes. A most promising approach is the decomposition of thin films under the destabilizing influence of long range Wan der Waals forces, but the complex patterns obtained still render their technological value rather unclear. Moreover, the limited scales (100nm) on which Wan der Waals forces can be accounted for is actually a great limitation to a broad range of applications. Here we reveal other perspectives to achieve the control of the destabilisation of thin films, and henceforth the resulting surface properties. The films are adsorbed on chemically patterned substrates and the alteration of the film surface is initiated up to thicknesses corresponding to several microns.