Dresden 2006 – scientific programme

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CPP: Chemische Physik und Polymerphysik

CPP 27: POSTER Polymer Physics and Materials

CPP 27.1: Poster

Thursday, March 30, 2006, 17:00–19:00, P2

Microfocus-Infrared Synchrotron Ellipsometry for analysis of laterally patterned organic thin films — •Michael Gensch¹, Ernst Heiner Korte², Norbert Esser¹, Ullrich Schade³, and Karsten Hinrichs¹ — ¹ISAS - Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Str. 9, 12489 Berlin, Germany — ²ISAS - Institute for Analytical Sciences, Bunsen-Kirchhoff-Str. 11, 44131 Dortmund, Germany — ³Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH, Albert-Einstein-Str. 15, 12489 Berlin, Germany

A purpose-build infrared spectroscopic ellipsometer is presented that enables to investigate sample areas of less than 1 mm2 with monolayer sensitivity. This sensitivity is achieved for films on metallic as well as on semiconducting substrates by utilizing radiation from an infrared synchrotron beamline at BESSY II. Measurement principle and performance of the instrument are discussed on selected examples and an outline of the recently performed upgrade of the set-up is given. It is shown how thickness, structure and composition of patterned nanofilms can be characterized by evaluation of the infrared ellipsometric parameters [2]. This is of technological relevance to investigate the functionality of e.g. stimuli responsive 1D polymer brush gradient films, biodiagnostic arrays or monomolecular films for solar cell applications. [1] M. Gensch, K. Roodenko, K. Hinrichs, R. Hunger, A. Merson, U. Schade, Y. Shapira, Th. Dittrich, J. Rappich, N. Esser, J. Vac. Sci. Technol. B 23, 1838 (2005). [2] K. Hinrichs, M. Gensch, N. Esser, Appl. Spectrosc. 59, 272A (2005).