Dresden 2006 – wissenschaftliches Programm
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CPP: Chemische Physik und Polymerphysik
CPP 27: POSTER Polymer Physics and Materials
CPP 27.9: Poster
Donnerstag, 30. März 2006, 17:00–19:00, P2
Bottom-Up Lithography: Growing Layout-Defined 3-dimensional Micro- and Nano-Structures by Molecular Self-Assembly — •Matthias Barczewski1,2, Alfred Blaszczyk1, Marcel Mayor1,3, Thomas Schimmel1,2, and Stefan Walheim1 — 1Institute for Nanotechnology, Forschungszentrum Karlsruhe, 76021 Karlsruhe (Germany) — 2Institute of Applied Physics, University of Karlsruhe, 76131 Karlsruhe (Germany) — 3Chemistry Department, University of Basel, 4056 Basel (Swizerland)
We present a novel soft-lithographic approach for the formation of metal-organic micro- and nanostructures on surfaces. The structures are grown from bottom up, instead of removing material from a resist layer [1]. This can be achieved by making use of an anisotropic molecular self-assembly process which leads to the formation of a metal-organic film which we call Substrate-Consuming Metal-Organic Layer (SCMOL). This growth can be laterally controlled by the pre-deposition of a mono-molecular two dimensional pattern, by Micro-Contact Printing. This patterned self-assembled monolayer (SAM) acts as a lateral stencil mask for the growth process of the SCMOL film. This process yields structures with perpendicular walls and a lateral resolution of about 20 nm. The height of the structures reaches up to 600 nm - hundred times the height of the constituent molecules.
[1] S. Walheim, M. Barczewski, A. Blaszczyk, M. Mayor, Th. Schimmel Patent application: DE 102005025693.7 (2005)