Dresden 2006 – scientific programme
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DF: Dielektrische Festkörper
DF 3: Poster Session
DF 3.10: Poster
Monday, March 27, 2006, 09:30–17:00, P1
Interfacial properties of Pb(Zr0.52Ti0.48)O3 on Pt(111)/Ti/SiO2/Si heterostructure — •Shiva Kumar Rudra1, Salah Habouti1, Claus-Henning Solterbeck1, Mohammed Es-Souni1, Vladimir Zaporojtchenko2, Michael Scharnberg2, and Franz Faupel2 — 1Institute for Materials and Surface Technology, University of Applied Sciences, Kiel, Germany — 2Technical Faculty, Chair of Multicomponent Materials, Christian-Albrechts-University, Kiel, Germany
Pb(Zr0.52Ti0.48)O3(PZT) thin films were processed by sol-gel method on Pt(111)/Ti/SiO2/Si substrate heterostructure. Interfacial composition and structure were investigated by means of X-ray photoelectron spectroscopy (XPS) in combination with depth profiling, and grazing incidence X-ray diffraction (GI-XRD). The surface roughness was measured by AFM. Ellipsometric studies as function of depth profiling are also reported. Various annealing temperatures such as 700∘C, 650∘C and 600∘C were considered. Deposited thin films were single layered PZT with 10% Pb excess of the precursor solution. It is shown that with increasing sputtering time the refractive index increases. XPS results show that prior to sputtering there is an enrichment of Pb on the surface as well as higher Zr/(Zr+Ti) ratio in comparison to nominal composition. The AFM studies show no difference between the as processed and sputtered samples. XPS and XRD results point to the formation of a Pt3Ti intermetallic layer at the PZT/Substrate interface.